SANTA CLARA, CA, May 26, 2026 ¡ª . (NASDAQ: MRVL), a leader in data infrastructure semiconductor solutions, today announced that the Chairman and CEO of ³Ô¹ÏºÚÁÏ, Matt Murphy, will deliver a keynote at COMPUTEX on June 2, 2026, entitled: ¡°The Future of AI Scaling Depends on Connectivity.¡± The keynote will also be livestreamed on the .
To power increasingly advanced AI workloads that extend beyond a single rack or even a single data center, AI infrastructure must continue scaling as a unified compute resource. As compute performance continues to advance, the next phase of AI innovation will increasingly depend on how efficiently data can move across accelerators, servers, racks, campuses and geographically distributed data centers at higher bandwidth, lower latency and lower power.
This next phase of AI scaling will require new approaches to connectivity. As the end-to-end connectivity leader, ³Ô¹ÏºÚÁÏ enables the critical connections in modern AI infrastructure to maximize data movement, from within servers and racks to the networks linking data centers across regions, allowing hyperscalers and cloud providers to deploy AI-optimized systems with unprecedented performance, scale and efficiency.
In his address, Mr. Murphy will discuss the company¡¯s decade-long investment in connectivity and optical technologies, and how ³Ô¹ÏºÚÁÏ has built the technology, product portfolio and ecosystem partnerships needed to help advance the future of AI infrastructure.
Event Details
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About ³Ô¹ÏºÚÁÏ
To deliver the data infrastructure technology that connects the world, we¡¯re building solutions on the most powerful foundation: our partnerships with our customers. Trusted by the world¡¯s leading technology companies for over 30 years, we move, store, process and secure the world¡¯s data with semiconductor solutions designed for our customers¡¯ current needs and future ambitions. Through a process of deep collaboration and transparency, we¡¯re ultimately changing the way tomorrow¡¯s enterprise, cloud and carrier architectures transform¡ªfor the better.
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